SAGHROUCHNI, H. . Advanced Process Control and Critical Dimension Control in Photolithography Process. International Journal of New Practices in Management and Engineering, [S. l.], v. 11, n. 1S, p. 18–19, 2022. DOI: 10.17762/ijnpme.v11i1S.139. Disponível em: https://www.ijnpme.org/index.php/IJNPME/article/view/139. Acesso em: 17 apr. 2026.